Modeling and Simulation in Crystal Growth

Invited speakers:

  • Andreas Fissel, Leibniz University of Hannover, Germany
    Impact of Surface Phase Coexistence on the Development of Step-free Areas on Si(111)
  • Vitalyi Talanin, Institute of economics and information technologies, Ukraine
    New Approach to the Defect Formation in Crystals
  • Lixin Zhang, Nankai University, China
    Surface Structures and the Defect Control During Epitaxy of Crystal

 

 

 

 

Workshop chair:

  • Xiaobin Niu, University of Electronic Science and Technology of China, China
Operating Organization

OAHOST
Sponsors
UESTC
University of Electronic Science and Technology of China
UARK

Springer