Committees

International Advisory Committee:

  • Enrique CALLEJA, Polytechnical University of Madrid, Spain
  • Florinda COSTA, University of Aveiro, Portugal
  • Knut DEPPERT, Lund University, Sweden
  • Partha DUTTA, Rensselaer Polytechnic Institute, USA
  • Chung-wen LAN, National Taiwan University, Taiwan
  • Pierangelo METRANGOLO, Politecnico di Milano, Italy
  • Srinivasan NATARAJAN, Indian Institute of Science, India
  • Vyacheslav V. OSIKO, Russian Academy of Sciences, Russia
  • Tania PASKOVA, North Carolina State University, USA
  • Robin D. ROGERS, University of Alabama, USA
  • Petra RUDOLFUniversity of Groningen, The Netherlands
  • Jagadese J. VITTAL, National University of Singapore, Singapore
  • Kader ZAIDAT, University of Grenoble Alpes, SIMAP, France

 

International Program Committee:

  • Jacek BARANOWSKI, Institute of Electronic Materials Technology, Poland
  • Mitch M. C. CHOU, National Sun Yat-Sen University, Taiwan
  • Govindhan DHANARAJ, Aymont Technology, Inc, USA
  • Marek GODLEWSKI, Polish Academy of Sciences, Poland
  • Stanislaw KRUKOWSKI, Polish Academy of Sciences, Poland
  • Aleksandar OSTROGORSKY, Illinois Institute of Technology, USA
  • Jolanta PRYWER, Technical University of Lodz, Poland
  • Stefano SANGUINETTI, Polytechnic University of Milan, Italy
  • Zbigniew ZYTKIEWICZ, Polish Academy of Sciences, Poland

 

International Organizing Committee:

  • Gautam R. DESIRAJU, Indian Institute of Science, India
  • Leonard R. MACGILLIVRAY, University of Iowa, USA
  • Xiaobin Niu, University of Electronic Science and Technology of China, China
  • Giuseppe RESNATI, Politecnico di Milano, Italy
  • Alexey VOLOSHIN, Russian Academy of Sciences, Russia
  • Jiyang WANG, Shandong University, China
  • Zhiming WANG, University of Electronic Science and Technology of China, China

 

Operating Organization

OAHOST
Sponsors
UESTC
University of Electronic Science and Technology of China
UARK

Springer